SY-GP515 is a cleaning agent developed to  be suitable for cleaning after polishing the SiC process.
          This product is a cleaning agent in the field of semiconductor wafers and  electromechanical components and has an excellent effect on cleaning organic  contaminants, metal contaminants, particles, and oxide films
| Product Type | Test Results | |
|---|---|---|
| Appearance | transparent liquid | |
| pH(25℃) | 12±0.5 | |
| specific gravity(@25℃) | 1.1±0.1 | |
It is a low-foam surfactant with high  permeability and low surface tension, and has excellent cleaning  power.
            Because of its excellent hydrophilicity, it  is easy to rinse and does not cause stains.
            After cleaning the semiconductor WAFER, there is no surface contamination  residue, and the process is not affected, so the WAFER surface defect rate can  be reduced.
- 150mm Wafer polishing process cleaner